Deposition of palladium nanodots of controlled size and density onto surface-modified SiO2 particles by an atmospheric pressure CVS/MOCVD process

Chemical Vapor Deposition

Volumn 13, Issue 1, 2007, Pages 48-54

  Binder, Axel ^a   Heel, Andre ^a   Kasper, Gerhard ^a  

^a UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

CVS; Hydroxyl surface groups; MOCVD; Palladium; Surface modification

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CIVIL AVIATION; CLIMATOLOGY; CONCENTRATION (PROCESS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; METEOROLOGY; NANOSTRUCTURED MATERIALS; SILICATES; SILICON COMPOUNDS; SYNTHESIS (CHEMICAL); THICKNESS MEASUREMENT; VENDING MACHINES;

ADJUSTING; CARRIER PARTICLES; CATALYST PARTICLES; CHEMICAL VAPOR SYNTHESIS; CONTINUOUS; CONTROLLED SIZES; CVS; CYCLOPENTADIENYL; FLOW REACTORS; GAS PHASES; HYDROXYL GROUPS; HYDROXYL SURFACE GROUPS; INTEGRATED METHODS; MEDIAN DIAMETERS; MOCVD; NANODOTS; NUMBER DENSITIES; OH GROUPS; ORGANIC; PHASE PROCESSES; PRECURSOR CONCENTRATIONS; SURFACE CONCENTRATIONS; SURFACE MODIFICATION; SYNTHESIS CONDITIONS;

PALLADIUM;

EID: 54949131364     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200606543     Document Type: Article

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