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Volumn 381, Issue 3, 2008, Pages 297-301

In situ TEM study of cubic zirconia implanted with caesium ions

Author keywords

[No Author keywords available]

Indexed keywords

CESIUM; DEFECTS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IN SITU PROCESSING; ION BEAMS; IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; YTTRIA STABILIZED ZIRCONIA; YTTRIUM OXIDE; ZIRCONIA;

EID: 54949117869     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2008.09.002     Document Type: Article
Times cited : (5)

References (23)
  • 9
    • 54949091204 scopus 로고    scopus 로고
    • A. Gentils, Effets d'irradiation et comportement des produits de fission dans la zircone et le spinelle, PhD Thesis, Université Paris-Sud, Orsay, France, 2003.
    • A. Gentils, Effets d'irradiation et comportement des produits de fission dans la zircone et le spinelle, PhD Thesis, Université Paris-Sud, Orsay, France, 2003.
  • 16
    • 54949136564 scopus 로고    scopus 로고
    • H. Bernas, M.-O. Ruault, P. Zheng, Multiple amorphous states in ion implanted semiconductors (Si and InP), in: Coffa et al. (Eds.), Crucial Issues in Semiconductor Materials and Processing Technologies, Kluver Academic Publishers, Netherlands, 1992, p. 459.
    • H. Bernas, M.-O. Ruault, P. Zheng, Multiple amorphous states in ion implanted semiconductors (Si and InP), in: Coffa et al. (Eds.), Crucial Issues in Semiconductor Materials and Processing Technologies, Kluver Academic Publishers, Netherlands, 1992, p. 459.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.