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Volumn 93, Issue 3, 2008, Pages 605-609
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Influence of the plasma parameters on the properties of aluminum oxide thin films deposited by laser ablation
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ABLATION;
ALUMINA;
ALUMINUM;
AMORPHOUS MATERIALS;
ATOMIC SPECTROSCOPY;
EMISSION SPECTROSCOPY;
IONS;
LASER ABLATION;
LASERS;
MOLECULAR SPECTROSCOPY;
NEODYMIUM LASERS;
OPTICAL EMISSION SPECTROSCOPY;
OXIDE FILMS;
OXIDES;
PHOTORESISTS;
PLASMA DENSITY;
PLASMA DEVICES;
PLASMAS;
PULSED LASER DEPOSITION;
THICK FILMS;
THIN FILMS;
ALUMINUM OXIDE THIN FILMS;
DEPOSITED MATERIALS;
EXCITED SPECIES;
GREAT-ER;
HIGH PURITIES;
II IONS;
ION ENERGIES;
LASER FLUENCE;
MEAN KINETIC ENERGIES;
ND:YAG LASERS;
PLANAR LANGMUIR PROBES;
PLASMA PARAMETERS;
STRUCTURAL CHARACTERISTICS;
TIME OF FLIGHTS;
PLASMA DIAGNOSTICS;
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EID: 54549121553
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-008-4705-x Document Type: Article |
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Times cited : (9)
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References (8)
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