Thermoluminescence properties of aluminum oxide thin films obtained by pulsed laser deposition

Radiation Measurements

Volumn 35, Issue 4, 2002, Pages 355-359

  Villarreal Barajas, J E ^a   Escobar Alarcon L ^a   Gonzalez P R ^a   Camps, E ^a   Barboza Flores, M ^b  

^a INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES   (Mexico)

^b UNIVERSIDAD DE SONORA   (Mexico)

Author keywords

Low penetrating radiation; Pulsed laser deposition; Thermoluminescence; Thin films

Indexed keywords

ACTIVATION ENERGY; ALUMINA; AMORPHOUS FILMS; DOSIMETERS; FILM PREPARATION; HIGH TEMPERATURE EFFECTS; IRRADIATION; PULSED LASER DEPOSITION; REACTION KINETICS; THERMOLUMINESCENCE; THICKNESS MEASUREMENT; ULTRAVIOLET RADIATION;

AMORPHOUS THIN FILMS;

THIN FILMS;

EID: 0036667208     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1350-4487(02)00062-8     Document Type: Article

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