Superhydrophobic composite films produced on various substrates

Langmuir

Volumn 24, Issue 19, 2008, Pages 11225-11232

  Manoudis, Panagiotis N ^a   Karapanagiotis, Ioannis ^b   Tsakalof, Andreas ^c   Zuburtikudis, Ioannis ^d   Panayiotou, Costas ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^b The Ormylia Foundation   (Greece)

^c UNIVERSITY OF THESSALY   (Greece)

^d TEI of Western Macedonia ^*  (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CONCENTRATION (PROCESS); CONTACT ANGLE; ELASTICITY; ESTERS; GLASS; HYDROPHILICITY; HYDROPHOBICITY; HYSTERESIS; NANOFLUIDICS; NANOPARTICLES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; SILICA; SILICON; SILICON COMPOUNDS; SUBSTRATES; TIN; TITANIUM COMPOUNDS;

AFM IMAGES; CONTACT ANGLE HYSTERESISES; DILUTE DISPERSIONS; GLASS SURFACES; HIERARCHICAL STRUCTURES; HYDROPHILIC NANOPARTICLES; HYDROPHILIC SILICAS; HYDROPHOBIC CHARACTERS; MAXIMUM VALUES; PARTICLE CONCENTRATIONS; POLY(METHYL METHACRYLATE); STATIC CONTACT ANGLES; SUPERHYDROPHOBIC; SUPERHYDROPHOBIC FILMS; SUPERHYDROPHOBICITY; TIN OXIDE NANOPARTICLES;

COMPOSITE FILMS;

NANOPARTICLE; POLY(METHYL METHACRYLATE); POLYMER; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; HYDROPHOBICITY; SCANNING ELECTRON MICROSCOPY; ULTRASTRUCTURE;

HYDROPHOBICITY; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOPARTICLES; POLYMERS; POLYMETHYL METHACRYLATE; SILICON DIOXIDE;

EID: 54549092794     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la801817e     Document Type: Article

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