Influence of tantalum dopant ions (Ta 5+) on the efficiency of the tungsten trioxide photoelectrode

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 8, 2008, Pages 2038-2041

  Enesca, A ^a   Duta, A ^a   Schoonman, J ^b  

^a TRANSILVANIA UNIVERSITY OF BRASOV   (Romania)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE STRUCTURES; DOPANT IONS; DOPING PROCESSES; ELECTRICAL PROPERTIES; PHOTO-LUMINESCENCE; TUNGSTEN TRIOXIDES; WATER PHOTOLYSISES;

DOPING (ADDITIVES); ELECTRIC PROPERTIES; ELECTROLYSIS; FLUORINE; OXIDE FILMS; PHOTOLYSIS; PLATINUM; SEMICONDUCTOR QUANTUM WELLS; SYSTEM STABILITY; TANTALUM; TIN; TITANIUM COMPOUNDS; TRANSITION METALS; TUNGSTEN;

SPRAY PYROLYSIS;

EID: 54249162414     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200778858     Document Type: Conference Paper

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