Dual-scale pattern formation in nanoparticle assemblies

Journal of Physical Chemistry C

Volumn 112, Issue 39, 2008, Pages 15195-15203

  Stannard, Andrew ^a   Martin, Christopher P ^a   Pauliac Vaujour, Emmanuelle ^a   Moriarty, Philip ^a   Thiele, Uwe ^b,c  

^a UNIVERSITY OF NOTTINGHAM   (United Kingdom)

^b LOUGHBOROUGH UNIVERSITY   (United Kingdom)

^c MAX PLANCK INSTITUT FÜR PHYSIK KOMPLEXER SYSTEME   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CELLULAR NEURAL NETWORKS; CELLULAR TELEPHONE SYSTEMS; CHEMICAL POTENTIAL; CHEMICALS; COMPUTER NETWORKS; CONCENTRATION (PROCESS); DEWATERING; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NETWORK PROTOCOLS; SENSOR NETWORKS; SOLVENTS; THREE DIMENSIONAL;

3D LATTICES; CELLULAR NETWORKS; COEXISTING; COLLOIDAL NANOPARTICLES; DEWETTING; DISJOINING PRESSURES; LENGTH SCALES; MODELING; MONTE-CARLO SIMULATIONS; MORPHO-LOGIES; MULTIPLE LENGTH SCALES; NANOPARTICLE ASSEMBLIES; NANOPARTICLE CONCENTRATIONS; NONEQUILIBRIUM STRUCTURES; PARAMETER SPACES; PATTERNING; SCALE PATTERNS; SIMULATION PARAMETERS; SMALL SCALES; SOLVENT DENSITIES; SPINODAL LINES;

NANOPARTICLES;

EID: 54249124601     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp803399d     Document Type: Article

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