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Volumn 14, Issue 12, 1998, Pages 3418-3424

Interplay between hole instability and nanoparticle array formation in ultrathin liquid films

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; EVAPORATION; INTERPOLATION; LIQUID METALS; MONOLAYERS; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; PASSIVATION; SOLVENTS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS;

EID: 0032499583     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la971147f     Document Type: Article
Times cited : (198)

References (30)
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    • note
    • BT) is the Hamaker constant appropriate to gold or silver metal (m) interacting through alkanses with the carbon substrate (s). r (2-3 nm) is the radius of the metal particle "core" and δ (1-2 nm) is the thickness of its adsorbed alkylthiol monolayer.
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    • Using the Langmuir equation for the net evaporation rate from a volatile bulk liquid film (see discussion, say, in Xia, T. K.; Landman, U. J. Chem. Phys. 1994, 101, 2498) leads to an estimate of about 1 ns for the time required for a R = 1 nm hole to open. However, one must be careful about using bulk viscosities and evaporation rates from films as thin as those in our system.
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    • note
    • 3, where γ is the fluid viscosity. Equating this to the ratio of the hole size R divided by the time γ for filling this hole, and taking γ = 0.1 poise and t = R = 1 nm, we find τ on the order of a nanosecond, and hence comparable to the evaporation time estimated in ref 19.
  • 29
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    • note
    • 7 for example, conclude that evaporation rates in their thin films are up to 100 times smaller than the corresponding bulk values.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.