Chemical adsorption of poly(3-alkylthiophene) on au using self-assembling technique

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 45-49, 2007, Pages

  Iida, Takahiro ^a   Sakai, Yasuhiro ^a   Shimomura, Takeshi ^b   Nakamura, Tohru ^c   Ito, Kohzo ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Ohemisorption; P3AT; SAM; Thiophene; XPS

Indexed keywords

ACOUSTIC MICROSCOPES; ADSORPTION; AMPLITUDE MODULATION; BOND STRENGTH (CHEMICAL); CHEMICAL BONDS; CHEMICAL MODIFICATION; CHEMICAL REACTIONS; CHEMISORPTION; ELECTRIC CONNECTORS; ELECTRIC SWITCHGEAR; ELECTROOPTICAL DEVICES; GRAFTING (CHEMICAL); INTEGRATED OPTICS; LIGHT EMITTING DIODES; MISSILE BASES; OPTOELECTRONIC DEVICES; ORGANIC POLYMERS; PHOTOELECTRON SPECTROSCOPY; SULFUR; SULFUR COMPOUNDS; SYNTHESIS (CHEMICAL); THIOPHENE;

ASSEMBLING PROCESSES; CHEMICAL ADSORPTIONS; HEAD GROUPS; METAL SURFACES; OHEMISORPTION; P3AT; POLYTHIOPHENE; SAM; SELF-ASSEMBLED MONOLAYERS; THIOLATE; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 54249093353     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L1126     Document Type: Article

References (18)

1. G. E. Poirier: Chem. Rev. 97 (1997) 1117.
2. F. P. Zamborini and R. M. Crooks: Langmuir 14 (1998) 3279.
3. E. Schreiber: Prog. Surf. Sci. 65 (2000) 151.
4. A. S. Duwez: J. Electron Spectrosc. Relat. Phenom. 134 (2004) 97.
5. S. C. Ng, P. Miao, Z. Chen, and H. S. O. Chan; Adv. Mater. 10 (1998) 782.
6. J. M. Tour, L. Jones, D. L. Pearson, J. J. S. Lamba, T. P. Burgin, G. M. Whitesides, D. L. Allara, A. N. Parikh, and S. V. Atre: J. Am. Chem. Soc. 117 (1995) 9529.
7. P. K. H. Ho, M. Granstrom, R. H. Friend, and N. C. Greenham: Adv. Mater. 10 (1998) 769.
8. Z. Gao, K. S. Siow, and H. S. O. Chan: Synth. Met. 75 (1995) 5.
9. Y. Shimoyama: Thin Solid Films 464-465 (2004) 403.
10. K. W. Hipps: Science 294 (2001) 536.
11. X. D. Cui. A. Primak, X. Zarate, J. Tomfohr, O. F. Sankey, A. L. Moore, T. A. Moore, D. Gust, G. Harris, and S. M. Lindsay: Science 294 (2001) 571.
12. W. Hu, H. Nakashima, K. Furukawa, Y. Kashimura, K. Ajito, C. Han, and K. Torimitsu: Phys. Rev. B 69 (2004) 165207.
13. J. Noh, E. Ito, K. Nakajima, J. Kim, H. Lee, and M. Hara: J. Phys. Chem. B 106 (2002) 7139.
14. E. O. Sako, H. Kondoh, T. Nakai, A. Nambu, T. Nakamura, and T. Ohta: Chem. Phys. Lett. 413 (2005) 267.
15. H. Kondoh, I. Nakai, A. Nambu, T. Ohta, T. Nakamura, R. Kimura, and M. Matsumoto: Chem. Phys. Lett. 350 (2001) 466.
16. A. Lachkar, A. Selmani, E. Sacher, M. Ledere, and R. Mokhliss: Synth. Met. 66 (1994) 209.
17. A. Lachkar, A. Selmani, and E. Sacher: Synth. Met. 72 (1995) 73.
18. M. Y. Teng, K. R. Lee, D. J. Liaw, and J. Y. Lai: Polymer 41 (2000) 2047.