SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 47, Issue 2 PART 1, 2008, Pages 1071-1075

Experimental analysis of reduced electric field during time-variable pulsed dielectric barrier discharge

(3) Choi, Jai Hyuk a Han, Man Hyeop b Baik, Hong Koo b

a UNIVERSITY OF TOKYO (Japan)

b Yonsei University (South Korea)

Author keywords

Air discharge; DBD; Dielectric barrier discharge; Pulse discharge; Reduced electric field

Indexed keywords

BOLTZMANN EQUATION; DIELECTRIC DEVICES; DISCHARGE (FLUID MECHANICS); DISSOCIATION; ELECTRIC DISCHARGES; ELECTRIC FIELD EFFECTS; ELECTRIC FIELD MEASUREMENT; ELECTRIC FIELDS; ELECTRON ENERGY LEVELS; FLOW CONTROL; GALLIUM ALLOYS; PLASMA APPLICATIONS; PLASMAS;

AIR DISCHARGE; DBD; DIELECTRIC BARRIER DISCHARGE; PULSE DISCHARGE; REDUCED ELECTRIC FIELD;

ELECTRIC NETWORK ANALYSIS;

EID: 54249086282 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.1071 Document Type: Article

Times cited : (15)

References (17)

1
- 0000748549
- X. P. Xu and M. J. Kushner: J. Appl. Phys. 83 (1998) 7522.
- (1998) J. Appl. Phys , vol.83 , pp. 7522
- Xu, X.P.¹ Kushner, M.J.²

2
- 0029356904
- J. J. Lowke and R. Morrow: IEEE Trans. Plasma Sci. 23 (1995) 661.
- (1995) IEEE Trans. Plasma Sci , vol.23 , pp. 661
- Lowke, J.J.¹ Morrow, R.²

3
- 0016127154
- L. Friedland: J. Phys. D 7 (1974) 2246.
- (1974) J. Phys. D , vol.7 , pp. 2246
- Friedland, L.¹

4
- 0038105123
- P. Bletzinger and B. N. Ganguly: J. Phys. D 36 (2003) 1550.
- (2003) J. Phys. D , vol.36 , pp. 1550
- Bletzinger, P.¹ Ganguly, B.N.²

5
- 0035821804
- S. Liu and M. Neiger: J. Phys. D 34 (2001) 1632.
- (2001) J. Phys. D , vol.34 , pp. 1632
- Liu, S.¹ Neiger, M.²

6
- 0032022902
- F. Massines, R. B. Gadri, A. Rabehi, Ph. Decomps, P. Segur, and Ch. Mayoux; J. Appl. Phys, 83 (1998) 2950.
- (1998) J. Appl. Phys , vol.83 , pp. 2950
- Massines, F.¹ Gadri, R.B.² Rabehi, A.³ Decomps, P.⁴ Segur, P.⁵ Mayoux, C.⁶

7
- 0030217625
- K. Terashima, L. Howald, H. Haefke, and H.-J, Güntherodt: Thin Solid Films 281-282 (1996) 634.
- (1996) Thin Solid Films , vol.281-282 , pp. 634
- Terashima, K.¹ Howald, L.² Haefke, H.³ Güntherodt, H.-J.⁴

8
- 0034310637
- T. Ito, T. Izaki, and K. Terashima: Surf. Coat. Technol. 133-134 (2000) 497.
- (2000) Surf. Coat. Technol , vol.133-134 , pp. 497
- Ito, T.¹ Izaki, T.² Terashima, K.³

9
- 0006270666
- J.-M. Torres and R. S. Dhariwal: Microsyst. Technol. 6 (1999) 6.
- (1999) Microsyst. Technol , vol.6 , pp. 6
- Torres, J.-M.¹ Dhariwal, R.S.²

10
- 33745622460
- J. H. Choi, T. I. Lee, I. Han, H. K. Baik, K. M. Song, Y. S. Lim, and E. S. Lee: Plasma Sources Sci. Technol. 15 (2006) 416.
- (2006) Plasma Sources Sci. Technol , vol.15 , pp. 416
- Choi, J.H.¹ Lee, T.I.² Han, I.³ Baik, H.K.⁴ Song, K.M.⁵ Lim, Y.S.⁶ Lee, E.S.⁷

11
- 0037272192
- U. Kogelschatz: IEEE Trans. Plasma Sci. 30 (2002) 1400.
- (2002) IEEE Trans. Plasma Sci , vol.30 , pp. 1400
- Kogelschatz, U.¹

12
- 0025385040
- W. L. Morgan and B. M. Penetrante: Comput. Phys. Commun. 58 (1990) 127.
- (1990) Comput. Phys. Commun , vol.58 , pp. 127
- Morgan, W.L.¹ Penetrante, B.M.²

13
- 54249103728
- Ph. D. Thesis, Seoul National University, Korea
- Y. Kim: Ph. D. Thesis, Seoul National University, Korea (2002).
- (2002)
- Kim, Y.¹

14
- 0035973286
- X. Xu: Thin Solid Films 390 (2001) 237.
- (2001) Thin Solid Films , vol.390 , pp. 237
- Xu, X.¹

15
- 2442565477
- Y. Kim, S. H. Hong, M. S. Cha, Y.-H. Song, and S. J. Kim: J. Adv. Oxid. Technol. 6 (2003) 17.
- (2003) J. Adv. Oxid. Technol , vol.6 , pp. 17
- Kim, Y.¹ Hong, S.H.² Cha, M.S.³ Song, Y.-H.⁴ Kim, S.J.⁵

16
- 0003903459
- IOP Publishing. Bristol, U.K
- J. R. Roth: Industrial Plasma Engineering (IOP Publishing. Bristol, U.K., 1995) Vol. 1.
- (1995) Industrial Plasma Engineering , vol.1
- Roth, J.R.¹

17
- 33749237824
- B. Qi, C. Ren, D. Wang, S.-Z. Li, K. Wang, and Y. Zhang: Appl. Phys. Lett. 89 (2006) 131503.
- (2006) Appl. Phys. Lett , vol.89 , pp. 131503
- Qi, B.¹ Ren, C.² Wang, D.³ Li, S.-Z.⁴ Wang, K.⁵ Zhang, Y.⁶

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