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Volumn , Issue , 2008, Pages 120-121
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Stabilization of temperature characteristics of micromirror for low-voltage driving using thin film torsion bar of tensile poly-Si
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Author keywords
Crystallization induced stress; Micromirror; Temperature characteristics; Tensile stress; Thin film torsion bar
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Indexed keywords
AMORPHOUS MATERIALS;
AMORPHOUS SILICON;
BEAMS AND GIRDERS;
COMPOSITE MICROMECHANICS;
CRYSTALLIZATION;
ELECTRIC CONNECTORS;
MEMS;
MICROELECTROMECHANICAL DEVICES;
NANOCRYSTALLINE ALLOYS;
PHOTONICS;
POLYSILICON;
SILICON;
SOLIDS;
TENSILE STRESS;
THERMAL EXPANSION;
THERMAL SPRAYING;
THICK FILMS;
THIN FILM DEVICES;
THIN FILMS;
TORSIONAL STRESS;
AMORPHOUS;
COEFFICIENT OF THERMAL EXPANSIONS;
DOPING;
ELECTRICAL CONNECTIONS;
LOW-VOLTAGE;
MICROMIRROR;
POLYCRYSTALLINE;
SI FILMS;
SI SUBSTRATES;
TEMPERATURE CHARACTERISTICS;
TENSILE;
THIN FILM TORSION BAR;
THIN FILM TORSION BARS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 54049096413
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/OMEMS.2008.4607858 Document Type: Conference Paper |
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Times cited : (1)
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References (5)
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