Ablation and water etching of plasma-treated polymers

Radiation Effects and Defects in Solids

Volumn 163, Issue 9, 2008, Pages 779-788

  Siegel, J ^a   Reznickova A ^a   Chaloupka, A ^a   Slepicka P ^a   Svorcik V ^a  

^a INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

Author keywords

Ablation and water etching; Chemical structure; Contact angle; Plasma treatment; Polymer; Surface morphology

Indexed keywords

ABLATION; ABS RESINS; ANGLE MEASUREMENT; ATOMIC SPECTROSCOPY; CHEMICAL BONDS; CONCENTRATION (PROCESS); CONTACT ANGLE; DISSOLUTION; ELECTRIC DISCHARGES; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA APPLICATIONS; PLASMAS; POLYMERS; POLYSTYRENES; POSITRON EMISSION TOMOGRAPHY; STRUCTURE (COMPOSITION); SURFACE TREATMENT; SURFACES; WATER RECYCLING; WATER TREATMENT;

AR PLASMAS; ATOMIC FORCES; CHEMICAL STRUCTURE; CHEMICAL STRUCTURES; CONJUGATED DOUBLE BONDS; FTIR SPECTROSCOPIES; MODIFIED POLYMERS; PLASMA DISCHARGES; PLASMA TREATMENT; PLASMA TREATMENTS; POLYMER SURFACE MORPHOLOGIES; THIN SURFACE LAYERS;

SURFACE MORPHOLOGY;

EID: 54049089679     PISSN: 10420150     EISSN: 10294953     Source Type: Journal    
DOI: 10.1080/10420150801969654     Document Type: Article

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