Deposition of SiO2 nanoparticles produced in a turbulent H 2/O2 flame

Aerosol Science and Technology

Volumn 42, Issue 11, 2008, Pages 873-883

  Horender, S ^a   Lipowsky, J ^a   Sommerfeld, M ^a   Schwerin, M ^b   Badeke, K U ^b  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^b WC Heraeus GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS; DYNAMICS; ELECTRIC CONDUCTORS; FLAME SPRAYING; FLUID DYNAMICS; FLUID MECHANICS; HYDROGEN; INTEGRATED OPTICS; NONMETALS; OPTOELECTRONIC DEVICES; SILICON COMPOUNDS; TURBOMACHINERY; TURBULENCE; VAPOR DEPOSITION;

COMBUSTION MODELLING; COMPUTATIONAL FLUID DYNAMICS (CFD); CYLINDRICAL TARGETS; DEPOSITION EFFICIENCIES; DEPOSITION PROCESSING; EXPERIMENTAL DATA; FLAME CONFIGURATIONS; FLAME TEMPERATURES; FLOW FIELDS; GAS VELOCITIES; OPTICAL WAVES; OUTSIDE VAPOR DEPOSITION; REASONABLE AGREEMENT; TURBULENCE LEVELS; TURBULENT DEPOSITION;

FLAMMABILITY;

HYDROGEN; NANOPARTICLE; OXYGEN; SILICON DIOXIDE;

ACID DEPOSITION; ARTICLE; COLD; COMBUSTION; COMPUTATIONAL FLUID DYNAMICS; HIGH TEMPERATURE PROCEDURES; PARTICLE SIZE; PRIORITY JOURNAL; SIMULATION; TEMPERATURE; TURBULENT FLOW; VAPOR;

EID: 52949092227     PISSN: 02786826     EISSN: 15217388     Source Type: Journal    
DOI: 10.1080/02786820802350766     Document Type: Article

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