Fabrication of block copolymer monolayers by adsorption from supercritical fluids: A versatile concept for modification and functionalization of polymer surfaces

Langmuir

Volumn 24, Issue 18, 2008, Pages 10488-10493

  Chen, Yong ^a   Koberstein, Jeffrey T ^a  

^a MC4721 ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARBITRARY SHAPES; FUNCTIONALIZATION; FUNCTIONALIZATION OF POLYMERS; GENERIC METHODS; PHOTO ACTIVE; POLYMER SURFACE MODIFICATION; SUBMONOLAYER FILMS;

ADSORPTION; BLOCK COPOLYMERS; COPOLYMERIZATION; EFFLUENT TREATMENT; ELECTRON ENERGY LEVELS; INDUSTRIAL WASTE TREATMENT; MONOLAYERS; OPTICAL DESIGN; PLASTIC PRODUCTS; STYRENE; SUPERCRITICAL FLUIDS;

POLYMERS;

CARBON DIOXIDE; CARBOXYLIC ACID; HEXANE; POLYMER; POLYSTYRENE DERIVATIVE; SOLVENT;

ADSORPTION; ARTICLE; CATALYSIS; CHEMISTRY; ELECTRON; HYDROLYSIS; METHODOLOGY; PHOTOCHEMISTRY; PRESSURE; SOLUBILITY; SURFACE PROPERTY; TEMPERATURE;

ADSORPTION; CARBON DIOXIDE; CARBOXYLIC ACIDS; CATALYSIS; ELECTRONS; HEXANES; HYDROLYSIS; PHOTOCHEMISTRY; POLYMERS; POLYSTYRENES; PRESSURE; SOLUBILITY; SOLVENTS; SURFACE PROPERTIES; TEMPERATURE;

EID: 52649087294     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la801589q     Document Type: Article

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