Advanced DSS MOSFET technology for ultrahigh performance applications

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2008, Pages 24-25

  Awano, M ^a   Onoda, H ^a   Miyashita, K ^a   Adachi, K ^a   Kawase, Y ^a   Miyano, K ^a   Yoshimura, H ^a   Nakayama, T ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DECISION SUPPORT SYSTEMS; FLUORINE; MESFET DEVICES; MOSFET DEVICES;

CARRIER INJECTIONS; CO-IMPLANT; DRIVE CURRENTS; EXTERNAL RESISTANCE; KEY TECHNOLOGIES; MOSFET PERFORMANCE; SCHOTTKY; SPIKE ANNEALING; VLSI TECHNOLOGIES;

TECHNOLOGY;

EID: 51949100175     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.2008.4588549     Document Type: Conference Paper

References (5)

1. A. Kinoshita et al., IEDM Tech. Dig., p. 79, 2006.
2. T. Kinoshita et al., IEDM Tech. Dig., p. 71, 2006.
3. H. Onoda et al., Symp. VLSI Tech. Dig., p. 76, 2007.
4. K. Mistry et al., IEDM Tech. Dig., p. 247, 2007.
5. S. Mayuzumi et al., IEDM Tech. Dig., p. 293, 2007.