High rate deposition of magnetic material by gas flow sputtering

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Bandorf, Ralf ^a   Bloche, Andre ^a   Ortner, Kai ^a   Lüthje, Holger ^a   Jung, Thomas ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Films; Gas sputtering; Hard magnetic films; High rate deposition; Magnetic films; Physical vapour deposition (PVD); Scanning electron microscopy (SEM); Soft magnetic films; Sputtering; Thin films

Indexed keywords

GAS SPUTTERING; HARD MAGNETIC FILMS; HIGH-RATE DEPOSITION; PHYSICAL VAPOUR DEPOSITION (PVD); SOFT MAGNETIC FILMS;

AERODYNAMICS; DEPOSITION; FLOW OF GASES; GAS PERMEABLE MEMBRANES; GASES; HARD COATINGS; MAGNETIC DEVICES; MAGNETIC FILMS; MAGNETIC FLUX; METALLIC FILMS; OXYGEN; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THIN FILMS;

FILM PREPARATION;

EID: 51849095286     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730504     Document Type: Conference Paper

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