Smoothing of nanoscale roughness based on the Kelvin effect

Nanotechnology

Volumn 19, Issue 36, 2008, Pages

  Yarin, Alexander L ^a   Megaridis, Constantine M ^a   Mattia, Davide ^b   Gogotsi, Yury ^c  

^a University of Illinois at Chicago   (United States)

^b University of Bath   (United Kingdom)

^c Drexel University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC COMPOUNDS; CONCENTRATION (PROCESS); NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; WALLS (STRUCTURAL PARTITIONS);

AXISYMMETRIC; CYLINDRICAL CHANNELS; NANO-SCALE ROUGHNESS;

SURFACE CHEMISTRY;

NANOMATERIAL; NANOPARTICLE;

ARTICLE; EXPERIMENTATION; KELVIN EFFECT; NANOANALYSIS; PHYSICAL PHENOMENA; POLYMERIZATION; PRIORITY JOURNAL; VAPORIZATION;

EID: 51349131866     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/36/365702     Document Type: Article

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