Cost-effective air-gap interconnects by all-in-one post-removing process

2008 IEEE International Interconnect Technology Conference, IITC

Volumn , Issue , 2008, Pages 193-195

  Nakamura, N ^a   Matsunaga, N ^a   Kaminatsui, T ^a   Watanabe, K ^a   Shibata, H ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR GAPS;

COST EFFECTIVENESS;

GALLIUM ALLOYS;

EID: 50949091865     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.2008.4546964     Document Type: Conference Paper

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6. A.Kajita et al., Proc. of IITC 2003, pp9-11.
7. N.Matsunaga et al., Proc. of IITC 2005, pp7-9