Photoinduced phenomena in As4Se3 amorphous thin films prepared by pulsed laser deposition

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8377-8380

  Nemec P ^a   Frumar, M ^a  

^a UNIVERSITY OF PARDUBICE   (Czech Republic)

Author keywords

68.55. a; 78.20.Ci; 78.66.Jg; 81.15.Fg; Amorphous materials; Optical properties; Pulsed laser deposition; Raman scattering

Indexed keywords

PULSED LASER APPLICATIONS;

68.55.-A; 78.20.CI; 78.66.JG; 81.15.FG; AMORPHOUS MATERIALS; OPTICAL PROPERTIES; PHOTOINDUCED PHENOMENA; PULSED-LASER DEPOSITION TECHNIQUE; RAMAN SCATTERING;

PULSED LASER DEPOSITION;

EID: 50849143790     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.036     Document Type: Article

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