Recent R&D activities of negative-ion-based ion source for JT-60SA

IEEE Transactions on Plasma Science

Volumn 36, Issue 4 PART 2, 2008, Pages 1519-1529

  Ikeda, Yoshitaka ^a   Hanada, Masaya ^a   Kamada, Masaki ^a   Kobayashi, Kaoru ^a   Umeda, Naotaka ^a   Akino, Noboru ^a   Ebisawa, Noboru ^a   Inoue, Takashi ^a   Honda, Atsushi ^a   Kawai, Mikito ^a   Kazawa, Minoru ^a   Kikuchi, Katsumi ^a   Komata, Masao ^a   Mogaki, Kazuhiko ^a   Noto, Katsuya ^a   Oasa, Kuzumi ^a   Oshima, Katsumi ^a   Sasaki, Shunichi ^a   Simizu, Tatsuya ^a   Takenouchi, Tadashi ^a   Tanai, Yutaka ^a   Usui, Katsutomi ^a   Watanabe, Kazuhiro ^a   Grisham, Larry R ^b   Kobayashi, Shinichi ^c   Yamano, Yasushi ^c   Takahashi, Masahiro ^c   more..

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b PRINCETON PLASMA PHYSICS LABORATORY   (United States)

^c SAITAMA UNIVERSITY   (Japan)

Author keywords

Beam optics; Injection power; JT 60 Super Advanced (JT 60SA); Negative ion beam; Negative ion based NBI (N NBI); Neutral beam; Voltage holding capability

Indexed keywords

ABS RESINS; COMPUTER NETWORKS; DUST COLLECTORS; ELECTRIC FIELDS; ELEMENTARY PARTICLE SOURCES; FIBER REINFORCED PLASTICS; FLOW INTERACTIONS; FUSION REACTORS; GLASS FIBERS; ION SOURCES; MAGNETIC FIELDS; NEGATIVE IONS; PARTICLE BEAM INJECTION; PLASMAS; RADIO INTERFERENCE; REINFORCED PLASTICS; SIMULATED ANNEALING; THREE DIMENSIONAL COMPUTER GRAPHICS;

BEAM OPTICS; INJECTION POWER; JT-60 SUPER ADVANCED (JT-60SA); NEGATIVE ION BEAM; NEGATIVE-ION-BASED NBI (N-NBI); NEUTRAL BEAM; VOLTAGE HOLDING CAPABILITY;

IONS;

EID: 50649087724     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.927382     Document Type: Article

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