Intergranular films in Si 3N 4 studied by TEM

Institute of Physics Conference Series

Volumn 179, Issue , 2004, Pages 401-404

  Doblinger M ^a   Marsh, C D ^a   Nguyen Manh, D ^a   Ozkaya, D ^a   Cockayne, D J H ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON ION MILLING; DIFFRACTION PATTERNS; INTERGRANULAR FILMS (IGFS); RADIAL DISTRIBUTION FUNCTION (RDF);

CERAMIC MATERIALS; CRYSTAL STRUCTURE; DIFFRACTION; ELECTRON DIFFRACTION; ELECTROSTATICS; GRAIN BOUNDARIES; SILICON COMPOUNDS; SINTERING; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS FILMS;

EID: 5044237225     PISSN: 09513248     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. Petzold G and Herrmann M Silicon Nitride Ceramics, High Performance Non-Oxide Ceramics II, Jansen M (editor), Structure and Bonding, 102, Mingos D M P (series editor), Springer Verlag, 47-167
2. Gu H, Cannon R M, Seifet H J, Hoffmann M J and Tanaka I, 2002 J. Am. Ceram. Soc. 85 25-32
3. Cockayne D J H and McKenzie, D R 1998 Acta Crystallographica Section A 44 870
4. McBride W Cockayne D J H and Nguyen-Manh D, submitted to Ultramicroscopy
5. Hoffmann M J, IKM, University of Karlsruhe, Germany
6. Tanaka I, Dept of Materials Science and Engineering, University of Kyoto, Japan
7. Gu H, Xiaoqing P, Cannon R M and Manfred R, 1998 J. Am. Ceram. Soc. 81 3125-3135
8. Mader W and Heinemann D, 1998 Ultramicroscopy 74 113-122