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Volumn 202, Issue 22-23, 2008, Pages 5746-5749
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Activated calcium silicate thinfilm by He plasma treatments
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Author keywords
Bioglass; Calcium silicate; DBD; e beam evaporation; Plasma treatment
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Indexed keywords
ATMOSPHERIC PRESSURE;
ATMOSPHERICS;
CALCIUM;
CALCIUM ALLOYS;
CONCENTRATION (PROCESS);
DIELECTRIC DEVICES;
ELECTRIC DISCHARGES;
EVAPORATION;
FORMING;
FUNCTIONAL GROUPS;
HELIUM;
INERT GASES;
MOISTURE;
NONMETALS;
ORGANOCLAY;
PHOSPHATES;
PLASMA APPLICATIONS;
PLASMAS;
SILICATES;
SILICON;
SILICON WAFERS;
SURFACE TREATMENT;
TITANIUM;
VAPORS;
BIOGLASS;
CALCIUM CONCENTRATION;
CALCIUM PHOSPHATE FORMATION;
CALCIUM PHOSPHATES;
CALCIUM SILICATE;
CALCIUM SILICATES;
DBD;
DBD TREATMENT;
DIELECTRIC-BARRIER DISCHARGES;
E-BEAM EVAPORATION;
ELECTRON-BEAM EVAPORATION;
HYDROPHILIC SURFACES;
HYDROXYL FUNCTIONAL GROUP;
MECHANICAL STRENGTHS;
PHOSPHATE-BUFFERED SALINE;
PLASMA TREATMENT;
PLASMA TREATMENTS;
POST TREATMENT PROCESSING;
CALCIUM PHOSPHATE;
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EID: 50349094461
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.06.081 Document Type: Article |
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Times cited : (3)
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References (13)
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