Crystallization behavior of Y123 films on CeO2-buffered YSZ substrates by fluorine-free metal-organic deposition

Physica C: Superconductivity and its Applications

Volumn 468, Issue 15-20, 2008, Pages 1559-1562

  Yamaguchi, I ^a   Sohma, M ^a   Tsukada, K ^a   Kamiya, K ^a   Kondo, W ^a   Kumagai, T ^a   Manabe, T ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Crystallization behavior; Film thickness; Metal organic deposition; Morphology; Y123 film

Indexed keywords

CRYSTALLIZATION BEHAVIOR; CRYSTALLIZATION BEHAVIORS; FILM THICKNESS; METAL-ORGANIC DEPOSITION; MORPHOLOGY; Y123 FILM; Y123 FILMS;

MOLECULAR BEAM EPITAXY;

EID: 50349093915     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2008.05.071     Document Type: Article

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