Resistivity and electric-field poling behaviors of DNA-based polymers compared to selected non-DNA polymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6646, Issue , 2007, Pages

  Yaney, Perry P ^a   Heckman, Emily M ^b   Grote, James G ^c  

^a UNIVERSITY OF DAYTON   (United States)

^b GENERAL DYNAMICS INFORMATION TECHNOLOGY   (United States)

^c AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

Alternating polarity; APC; DNA; Electric field poling; Electro optic coefficient; emf; Guarded electrode; PMMA; Poly(4 vinylphenol); Polymer films; PVP; Resistivity

Indexed keywords

CHEMICAL PLANTS; DNA; ELECTRIC FIELD EFFECTS; ELECTRIC FIELDS; ELECTROLYSIS; ELECTROMAGNETIC FIELD THEORY; ELECTROMAGNETIC FIELDS; ELECTROOPTICAL DEVICES; GENES; GOLD; INTEGRATED OPTICS; METALLIZING; NUCLEIC ACIDS; ORGANIC ACIDS; PHOTORESISTS; PLASTIC FILMS; POLYMERS; SPIN GLASS;

ALTERNATING POLARITY; APC; ARRHENIUS; DNA POLYMERS; ELECTRIC FIELD POLING; ELECTRO-OPTIC COEFFICIENT; ELECTRO-OPTIC COEFFICIENTS; EMF; GLASS SLIDES; GOLD ELECTRODES; GUARDED ELECTRODE; HIGH ELECTRIC FIELDS; PMMA; POLY(4-VINYLPHENOL); PVP; RESISTIVITY; TEMPERATURE DEPENDENCES;

POLYMER FILMS;

EID: 50249163112     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.742127     Document Type: Conference Paper

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