Characterization of NLO polymer materials for optical waveguide structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6117, Issue , 2006, Pages

  Yaney, Perry P ^a   Heckman, Emily M ^a,b   Davis, Antonio ^a,b   Hagen, Joshua A ^c   Bartsch, Carrie M ^b,d   Subramanyam, Guru ^d   Grote, James G ^e   Hopkins, F Kenneth ^e  

^a UNIVERSITY OF DAYTON   (United States)

^b Anteon Corporation   (United States)

^c UNIVERSITY OF CINCINNATI   (United States)

^d University of Dayton   (United States)

^e AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

Alternating polarity; Dielectric constant; Dissipation factor; DNA; Electro absorption; Electro optic coefficient; Guarded electrode; Optical waveguides; Polymer films; Resistivity; Teng and Man; Waveguide coupling; Waveguide loss

Indexed keywords

ALTERNATING POLARITY; DISSIPATION FACTOR; ELECTRO-ABSORPTION; ELECTRO-OPTIC COEFFICIENT; GUARDED ELECTRODE; POLYMER FILMS; RESISTIVITY; TENG AND MAN; WAVEGUIDE COUPLING; WAVEGUIDE LOSS;

CHROMOPHORES; CONDUCTIVE FILMS; DNA; PERMITTIVITY; POLYMERS; REFRACTIVE INDEX; SILICON WAFERS; SPIN COATING;

OPTICAL WAVEGUIDES;

EID: 33646696439     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.646398     Document Type: Conference Paper

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