Charging and plasma effects under ultrashort pulsed laser ablation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7005, Issue , 2008, Pages

  Bulgakova, N M ^a   Bulgakov, A V ^a   Zhukov, V P ^b   Marine, W ^c   Vorobyev, A Y ^d   Guo, Chunlei ^d  

^a KUTATELADZE INSTITUTE OF THERMOPHYSICS   (Russian Federation)

^b INSTITUTE OF COMPUTATIONAL TECHNOLOGIES   (Russian Federation)

^c CAMPUS DE LUMINY   (France)

^d UNIVERSITY OF ROCHESTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; CHEMICAL ENGINEERING; CHEMICAL REACTIONS; DYNAMICS; ELECTRIC NETWORK ANALYSIS; ELECTROMAGNETIC INDUCTION; ELECTROMAGNETISM; ETCHING; HEATING; INDUCTANCE; IONIZATION OF GASES; LASER ABLATION; LASER APPLICATIONS; LASERS; MAGNETISM; MECHANISMS; PLASMA ETCHING; PLASMAS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SURFACE CHARGE; TARGETS; ULTRASHORT PULSES;

2-D MODELING; AMBIENT GASES; AMBIENT PLASMAS; COULOMB EXPLOSION; FEMTO-SECOND LASER; FEMTO-SECOND LASER PULSES; FUNDAMENTAL MECHANISMS; HIGH-POWER LASERS; LASER PROCESSING; LASER-INDUCED; LASER-INDUCED BREAKDOWN; LASER-INDUCED IONIZATION; METALLIC TARGETS; PLASMA CHEMICAL PROCESSING; PLASMA EFFECTS; SURFACE CHARGING; THEORETICAL ANALYSIS; TIME -OF-FLIGHT; ULTRA-FAST; ULTRASHORT LASERS; ULTRASHORT PULSED LASER;

IONIZATION OF SOLIDS;

EID: 50249159425     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.782643     Document Type: Conference Paper

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