SCOPUS 정보 검색 플랫폼

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS

Volumn , Issue , 2008, Pages 881-884

Recrystallized parylene as a mask for silicon chemical etching

(4) Lo, Hsi Wen a Kuo, Wen Cheng a,b Yang, Yao Joe b Tai, Yu Chong a

a CALIFORNIA INSTITUTE OF TECHNOLOGY (United States)

b NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

Parylene; Recrystallization; Silicon wet etching

Indexed keywords

HYDROFLUORIC ACID; INTERFACES (MATERIALS); POTASSIUM HYDROXIDE; RECRYSTALLIZATION (METALLURGY); WET ETCHING;

ACID SOLUTIONS; CHEMICAL ETCH; CHEMICAL ETCHING; MASKING MATERIAL; PARYLENE C; PARYLENES; RECRYSTALLISATION; SILICON ETCHING; SILICON WET ETCHING; TETRAMETHYL AMMONIUM HYDROXIDE;

SILICON;

EID: 50249154909 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/NEMS.2008.4484464 Document Type: Conference Paper

Times cited : (9)

References (8)

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2
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3
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- An Integrated Microchip With Conventionally-Packed Liquid Chromotography Column and Electrospray Ionization Nozzle for LC-ESI-MS Applications
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4
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- Spiral-Tube Parylene Intraocular Pressure Sensor
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5
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6
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7
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8
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- The Mechanism Anisotropic Silicon Etching and Its Relevance for Micromachining
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