|
Volumn , Issue , 2007, Pages 217-220
|
An approach to cost-effective, robust, large-area electronics using monolithic silicon
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CELL MANUFACTURING;
CURVED SURFACES;
DEEP REACTIVE ION ETCHING;
LARGE-AREA ELECTRONICS;
RF-ID TAGS;
SILICON ELECTRONICS;
SILICON SUBSTRATES;
SILICON-INTEGRATED CIRCUITS;
SMART MATERIALS;
WIRED NETWORKS;
COST EFFECTIVENESS;
DIRECT ENERGY CONVERSION;
ELECTRON DEVICES;
ELECTRONICS INDUSTRY;
INTEGRATED CIRCUITS;
LITHOGRAPHY;
NETWORKS (CIRCUITS);
NONMETALS;
RADIO NAVIGATION;
REACTIVE ION ETCHING;
SILICON;
SOLAR ENERGY;
TEXTILE PROCESSING;
TWO DIMENSIONAL;
MONOLITHIC INTEGRATED CIRCUITS;
|
EID: 50249152442
PISSN: 01631918
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/IEDM.2007.4418906 Document Type: Conference Paper |
Times cited : (34)
|
References (5)
|