Plasma bubble in an RF reactor

IEEE Transactions on Plasma Science

Volumn 36, Issue 4 PART 1, 2008, Pages 1370-1371

  Sigeneger, Florian ^a   Basner, Ralf ^a   Loffhagen, Detlef ^a   Kersten, Holger ^b  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^b UNIVERSITY OF KIEL   (Germany)

Author keywords

Adaptive electrode (AE); Fluid model; RF reactor

Indexed keywords

ARGON; ATMOSPHERIC ELECTRICITY; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; INERT GASES; PLASMAS;

ADAPTIVE ELECTRODE (AE); ARGON PLASMAS; CAPACITIVELY COUPLED; ELECTRON DENSITIES; EMISSION INTENSITIES; FLUID MODEL; FLUID MODELING; INCREASED EXCITATION RATE; PLASMA BUBBLES; PLASMA SCIENCE; REACTOR CONFIGURATION; RF REACTOR; RF VOLTAGE; SPATIAL STRUCTURING;

COUPLED CIRCUITS;

EID: 50249120528     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.920898     Document Type: Article

References (4)

1. B. Annaratone, T. Antonova, D. Goldbeck, H. Thomas, and G. Morfill, "Complex-plasma manipulation by radiofrequency biasing," Plasma Phys. Control. Fusion, vol. 46, no. 12B, pp. B495-B509, Dec. 2004.
2. M. Tatanova, G. Thieme, R. Basner, M. Hannemann, Y. B. Golubovskii, and H. Kersten, "About the EDF formation in a capacitively coupled argon plasma," Plasma Sources Sci. Technol., vol. 15, no. 3, pp. 507-516, Aug. 2006.
3. G. Thieme, R. Basner, R. Wiese, and H. Kersten, "Microparticles in plasmas as diagnostic tools and substrates," Faraday Discuss., vol. 137, pp. 157-171, 2008.
4. F. Sigeneger, D. Loffhagen, R. Basner, and H. Kersten, "Analysis of an asymmetric RF discharge used for micro-particle treatment," in Proc. 16th Int. Conf. Gas Discharges Their Appl., 2006, pp. 469-472.