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Volumn 48, Issue 8-9, 2008, Pages 1553-1556

MIMC reliability and electrical behavior defined by a physical layer property of the dielectric

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CAPACITORS; CHARGE TRAPPING; CHEMICAL PROPERTIES; CONCENTRATION (PROCESS); DIELECTRIC DEVICES; ELECTRIC CHARGE; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTRIC EQUIPMENT; ELECTRIC FIELDS; ELECTRIC PROPERTIES; ELECTROMAGNETIC FIELD THEORY; ELECTROMAGNETIC FIELDS; ENERGY STORAGE; ERROR ANALYSIS; FEES AND CHARGES; FINANCE; IONIZATION OF GASES; LEAKAGE CURRENTS; METAL INSULATOR BOUNDARIES; METALS; OPTICAL PROPERTIES; REFRACTIVE INDEX; SILICON;

EID: 50249108385     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2008.06.043     Document Type: Article
Times cited : (9)

References (12)
  • 1
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    • McCreary L. Matching properties and voltage and temperature dependence of MOS capacitors. IEEE J Solid-State Circ 16 (1981) 608-616
    • (1981) IEEE J Solid-State Circ , vol.16 , pp. 608-616
    • McCreary, L.1
  • 2
    • 0026692318 scopus 로고
    • Thin gate and analog capacitor dielectrics for submicron device fabrication
    • Tay S.P., and Ellui J.P. Thin gate and analog capacitor dielectrics for submicron device fabrication. J Electron Mater 21 1 (1992) 45-55
    • (1992) J Electron Mater , vol.21 , Issue.1 , pp. 45-55
    • Tay, S.P.1    Ellui, J.P.2
  • 3
    • 0024172251 scopus 로고    scopus 로고
    • Kaya C, Tigelaar H, Paterson J, de Wit M, Fattaruso J, Kiriakai S et al. Polycide/metal capacitors for high precision A/D converters. In: IEDM tech dig; 1988. p. 782-785.
    • Kaya C, Tigelaar H, Paterson J, de Wit M, Fattaruso J, Kiriakai S et al. Polycide/metal capacitors for high precision A/D converters. In: IEDM tech dig; 1988. p. 782-785.
  • 4
    • 0032226772 scopus 로고    scopus 로고
    • Yin A, White J, Karroy A, Hu C. Integration of polycide/metal capacitors in advanced device fabrication. In: Proceedings of the fifth international conference solid-state and integrated circuit technology; 1998. p. 131-134.
    • Yin A, White J, Karroy A, Hu C. Integration of polycide/metal capacitors in advanced device fabrication. In: Proceedings of the fifth international conference solid-state and integrated circuit technology; 1998. p. 131-134.
  • 5
    • 50249171315 scopus 로고    scopus 로고
    • Yota J, Ramanathan R, Arreaga J, Dai P, Cismaru C, Burton R et al. Development and characterization of a 600 Å PECVD Si3N4 high density MIM capacitor for InGaP/GaAs HBT applications. In: International conference on compound semiconductor; 2003.
    • Yota J, Ramanathan R, Arreaga J, Dai P, Cismaru C, Burton R et al. Development and characterization of a 600 Å PECVD Si3N4 high density MIM capacitor for InGaP/GaAs HBT applications. In: International conference on compound semiconductor; 2003.
  • 7
    • 0024628145 scopus 로고
    • MIM capacitor fabrication and assessment for GaAs MMICs
    • Nagle J.P., Sangha S., and West P.J. MIM capacitor fabrication and assessment for GaAs MMICs. J Electron Mater 18 2 (1989) 167-169
    • (1989) J Electron Mater , vol.18 , Issue.2 , pp. 167-169
    • Nagle, J.P.1    Sangha, S.2    West, P.J.3
  • 8
    • 34249971631 scopus 로고
    • Quantitative Auger depth profiling of LPCVD and PECVD silicon nitride films
    • Keim E.G., and Ai{dotless}̈te K. Quantitative Auger depth profiling of LPCVD and PECVD silicon nitride films. J Anal Chem 333 4-5 (1989) 319-321
    • (1989) J Anal Chem , vol.333 , Issue.4-5 , pp. 319-321
    • Keim, E.G.1    Aïte, K.2
  • 12
    • 50249090592 scopus 로고    scopus 로고
    • van Delden MHWM, van der Wei PJ. In: 41st Annual international reliability physics symposium, Dallas, Texas; 2003. p. 293-297.
    • van Delden MHWM, van der Wei PJ. In: 41st Annual international reliability physics symposium, Dallas, Texas; 2003. p. 293-297.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.