Microplasma device utilizing SU-8 photoresist as a barrier rib

IEEE Transactions on Plasma Science

Volumn 36, Issue 4 PART 1, 2008, Pages 1244-1245

  Kim, Sung O ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Chromium; Electrodes; Firing; Glass; Glow discharges; Microdischarge; Photonics; Resists

Indexed keywords

ELECTRIC DISCHARGES; ELECTRIC PROPERTIES; GLOW DISCHARGES; INERT GASES; LITHOGRAPHY; NEON; OPTICAL DESIGN; PHOTORESISTORS; PHOTORESISTS; PLASMA DEVICES; SURFACE TREATMENT;

BARRIER RIBS; CHROMIUM; DIFFERENT FREQUENCIES; ELECTRICAL PROPERTIES; ELECTRODES; FABRICATION PROCESSES; FIRING; GEOMETRIC PATTERNS; GLASS; HEXAGONAL STRUCTURES; LOW COSTS; LOW FIRING VOLTAGE; MICRO PLASMAS; MICRODISCHARGE; PHOTONICS; PLASMA SCIENCE; RESISTS; SU-8 PHOTORESISTS; VOLTAGE WAVEFORMS;

PLASMA DISPLAY DEVICES;

EID: 50249092844     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.922939     Document Type: Article

References (5)

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5. S.-O. Kim and J. G. Eden, "Arrays of square cross-section microdischarge devices fabricated in glass and driven by interdigitated electrodes," IEEE Trans. Plasma Sci., vol. 33, no. 2, pp. 566-567, Apr. 2005.