Arrays of square cross-section microdischarge devices fabricated in glass and driven by interdigitated electrodes

IEEE Transactions on Plasma Science

Volumn 33, Issue 2 I, 2005, Pages 566-567

  Kim, S O ^a   Eden, J G ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Interdigitated electrodes; Microdischarges; Microplasmas; Photolithography

Indexed keywords

ARRAYS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRODES; GLASS; NEON; PHOTOLITHOGRAPHY; PLASMAS; PRESSURE;

INTERDIGITATED ELECTRODES; MICRODISCHARGES; MICROPLASMAS;

PLASMA DEVICES;

EID: 18844369071     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2005.845309     Document Type: Article

References (3)

1. J. G. Eden, S.-J. Park, N. P. Ostrom, S. T. McCain, C. J. Wagner, B. A. Vojak, J. Chen, C. Liu, P. von Allmen, F. Zenhausern, D. J. Sadler, C. Jensen, D. L. Wilcox, and J. J. Ewing, "Microplasma devices fabricated in silicon, ceramic, and metal/polymer structures: Arrays, emitters, and photodetectors," J. Phys. D, vol. 36, pp. 2869-2877, 2003.
2. S.-J. Park, J. Chen, C. J. Wagner, N. P. Ostrom, C. Liu, and J. G. Eden, "Microdischarge arrays: A new family of photonic devices," IEEE J. Sel. Topics Quantum Electron., vol. 8, no. 2, pp. 387-394, Mar./Apr. 2002.
3. R. M. Sankaran and K. P. Giapis, "Maskless etching of silicon using patterned microdischarges," Appl. Phys. Lett., vol. 79, pp. 593-595, 2001.