Extreme ultraviolet plasma source for future lithography

IEEE Transactions on Plasma Science

Volumn 36, Issue 4 PART 1, 2008, Pages 1280-1281

  Wagenaars, Erik ^a   Mader, Arnaud ^c   Bergmann, Klaus ^b   Jonkers, Jeroen ^c   Neff, Willi ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

Extreme ultraviolet; Gas discharges; Lithography; Plasma pinch

Indexed keywords

DEBRIS; LASER PULSES; LIGHT; LITHOGRAPHY; PLASMA SOURCES; PLASMAS;

COLLECTOR SYSTEMS; DEBRIS MITIGATION; EUV LITHOGRAPHY; EXTREME ULTRAVIOLET; FOCUSED BEAMS; GAS DISCHARGES; PLASMA PINCH; PLASMA SCIENCE;

ULTRAVIOLET DEVICES;

EID: 50249092006     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.917780     Document Type: Article

References (6)

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