Numerical simulation of electroosmotic flow in microchannels with sinusoidal roughness

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 328, Issue 1-3, 2008, Pages 28-33

  Yang, Dayong ^a   Liu, Ying ^a  

^a NANCHANG UNIVERSITY   (China)

Author keywords

Electroosmotic flow; Finite element method; Microchannel; Sinusoidal; Surface roughness

Indexed keywords

COMPUTER SIMULATION; ELECTROOSMOSIS; FINITE ELEMENT METHOD; FLOW RATE; FLOW VELOCITY; INTEGRATED CIRCUITS; MICROCHANNELS; MIXING; NANOFLUIDICS; SURFACE ROUGHNESS;

BULK FLOW; BULK VELOCITY; ELECTROOSMOTIC FLOW; ELEMENT DENSITY; FINITE-ELEMENT METHODS; GOVERNING EQUATIONS; MICROCHANNEL; MICROCHANNEL SURFACES; NUMERICAL SIMULATIONS; OPTIMAL DESIGNS; PARALLEL PLATES; ROUGHNESS HEIGHT; SIMULATION RESULTS; SINUSOIDAL; SINUSOIDAL ROUGHNESS; SINUSOIDAL SURFACES; VOLUMETRIC FLOW RATES;

FLOW SIMULATION;

ARTICLE; ELECTRIC FIELD; ELECTROOSMOSIS; FINITE ELEMENT ANALYSIS; FLOW RATE; MATHEMATICAL MODEL; MICROCHIP ANALYSIS; MICROFLUIDIC ANALYSIS; MICROFLUIDICS; POROSITY; PRIORITY JOURNAL; SIMULATION; SURFACE PROPERTY;

EID: 50049114103     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2008.06.029     Document Type: Article

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