Investigations of SU-8 removal from metallic high aspect ratio microstructures with a novel plasma technique

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1607-1612

  Engelke, Rainer ^a   Mathuni, Josef ^b   Ahrens, Gisela ^a   Gruetzner, Gabi ^a   Bednarzik, Martin ^c   Schondelmaier, Daniel ^c   Loechel, Bernd ^c  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

^b R3T GmbH   (Germany)

^c Berliner Elektronenspeicherring Gesellschaft fuer Synchrotronstrahlung (Bessy) MbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CARBON; CHEMICAL REACTIONS; ELECTRONICS INDUSTRY; ETCHING; EXPERIMENTS; FREE RADICAL POLYMERIZATION; GRAPHITE; ION BOMBARDMENT; MASKS; METAL RECOVERY; METALS; MICROWAVES; MOLECULAR BEAM EPITAXY; NONMETALS; OXYGEN; PHOTORESISTS; PLASMA DIAGNOSTICS; PLASMA ETCHING; PLASMAS; RATE CONSTANTS; RELIABILITY; STRUCTURAL METALS; THICK FILMS; WEIGHT CONTROL;

APPLICATION EXAMPLES; BASIC IDEA; CHEMICAL RADICALS; CHEMICAL-; CONTROLLED PROCESS; ETCHING PROCESSES; ETCHING RATES; HIGH ASPECT RATIO MICROSTRUCTURES; METAL STRUCTURES; MICRO-PARTS; MICROWAVE PLASMA; OXYGEN RADICALS; PLASMA ETCHING TECHNIQUE; PLASMA TECHNIQUES; PLASMA ZONE; SENSITIVE MATERIALS; SU-8 REMOVAL; THERMAL MANAGEMENT; TRAVELING WAVES; WATER COOLING; X-RAY MASKS;

X RAY LITHOGRAPHY;

ETCHING; GRAPHITE; MASKING; MICROSTRUCTURE; PLASMA; SUBSTRATES;

EID: 49949117624     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0537-4     Document Type: Conference Paper

References (7)

1. Dentinger PM, Clift WM, Goods SH (2002) Removal of SU-8 photoresist for thick film applications. In: Proceedings of 27th conference on micro- and nano-engineering MNE 2001. Microelectron Eng 61-62:993-1000
2. Gruetzner G, Degen R, Loechel B, Ahrens G, Bednarzik M, Engelke R, Kirsch U (2007) Extreme aspect ratio NiFe gear wheels for the production of commercially available Micro Harmonic Drive with SU-8, high aspect ratio micro structure technologies workshop HARMST 2007, Besançon, June
3. Jian L, Desta YM, Goettert J, Bednarzik M, Loechel B, Yoonyoung J, Aigeldinger G, Singh V, Ahrens G, Gruetzner G, Ruhmann R, Degen R (2003) SU-8 based deep X.ray lithography/LIGA. SPIE 4797:394
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6. Hong G, Holmes AS, Heaton MA (2004) SU 8 resist plasma etching and its optimisation. Microsyst Technol 10:357-359
7. PVA TePla Press release, December 2006 (2006)