Transmission electron microscopy characterization of Al2Cu precipitate growth kinetics by in situ heat treatment

Vacuum

Volumn 83, Issue 1, 2008, Pages 107-112

  Park, Min Woo ^a   Lee, Joo Sin ^a   Lim, Dong Gun ^b   Choi, Yong Gyu ^c   Kwak, Dong Joo ^a   Sung, Youl Moon ^a  

^a Kyungsung University   (South Korea)

^b Chungju National University   (South Korea)

^c Gyeongbuk Regional Innovation Agency   (South Korea)

Author keywords

Al2Cu precipitate; Collector plate mechanism; In situ isothermal annealing; Thin film; Transmission electron microscopy

Indexed keywords

GROWTH KINETICS;

AL2CU PRECIPITATE; COLLECTOR PLATE MECHANISM; IN SITU ISOTHERMAL ANNEALING; THIN FILM; TRANSMISSION ELECTRON; TRANSMISSION ELECTRON MICROSCOPY;

ALUMINUM;

EID: 49949107027     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.03.049     Document Type: Article

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