Effect of applying ultrasonic vibration in thermal nanoimprint lithography

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1325-1333

  Mekaru, Harutaka ^a   Noguchi, Toshihiko ^a   Goto, Hiroshi ^a,b   Takahashi, Masaharu ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Toshiba Machine Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; BORON NITRIDE; ELECTRONICS ENGINEERING; FORMING; GLASS TRANSITION; KETONES; MOLDING; NANOIMPRINT LITHOGRAPHY; NANOTECHNOLOGY; NITRIDES; NONMETALS; ULTRASONIC EFFECTS; ULTRASONIC WAVES; ULTRASONICS; VIBRATIONS (MECHANICAL); VIBRATORS;

ACOUSTICAL VIBRATION; GLASS TRANSITION TEMPERATURE TG; HIGH AMPLITUDES; LINE WIDTHS; LOADING FORCE; MICRO HOT EMBOSSING; MOLDING PROCESSES; NANO IMPRINTS; NANO-IMPRINTING; TIMING POINT; ULTRASONIC VIBRATIONS;

LATTICE VIBRATIONS;

EMBOSSING; LITHOGRAPHY; POLYCARBONATES; PYROLYSIS; STRESSES; VIBRATION;

EID: 49949099647     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0512-0     Document Type: Conference Paper

References (7)

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