SCOPUS 정보 검색 플랫폼

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1285-1290

Microlens array fabrication by backside exposure using fraunhofer diffraction

(5) Song, In Hyouk a Kang, Kyung Nam b Jin, Yoonyoung b Park, Daniel S W b Ajmera, Pratul K b

a ÉCOLE POLYTECHNIQUE DE MONTRÉAL (Canada)

b LOUISIANA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GALLIUM ALLOYS; GLASS; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MICROLENSES; MICROOPTICS; MICROSTRUCTURE; OPTICAL DESIGN; OPTICAL INSTRUMENT LENSES; PHOTORESISTS;

BACK-SIDE EXPOSURE; CIRCULAR APERTURES; EXPOSURE INTENSITY; FAR-FIELD DIFFRACTION; FRAUNHOFER; FRAUNHOFER DIFFRACTION; FRESNEL; MICRO-LENS ARRAYS; NEAR-FIELD DIFFRACTION; PROXIMITY PRINTING; PYREX 7740 GLASS; SMALL GAPS; SU-8 RESISTS; SURFACE PROFILING; TRANSPARENT GLASSES; UV-LITHOGRAPHY;

DIFFRACTION;

EID: 49949096842 PISSN: 09467076 EISSN: None Source Type: Journal
DOI: 10.1007/s00542-007-0510-2 Document Type: Conference Paper

Times cited : (12)

References (8)

1
- 0033101285
- Wall profile of thick photoresist generated via contact printing
- Cheng Y, Lin CY, Wei DH, Loechel B, Gruetzner G (1999) Wall profile of thick photoresist generated via contact printing. IEEE J Microelectromech Syst 8:18-26
- (1999) IEEE J Microelectromech Syst , vol.8 , pp. 18-26
- Cheng, Y.¹ Lin, C.Y.² Wei, D.H.³ Loechel, B.⁴ Gruetzner, G.⁵

2
- 0036693343
- Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination
- Chuang YJ, Tseng FG, Lin WK (2002) Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination. Microsyst Technol 8:308-313
- (2002) Microsyst Technol , vol.8 , pp. 308-313
- Chuang, Y.J.¹ Tseng, F.G.² Lin, W.K.³

3
- 49949113627
- 4 Addison-Wesley San Francisco
- Hacht E (2002a) Optics, chap 10, 4th edn. Addison-Wesley, San Francisco
- (2002) Optics, Chap 10
- Hacht, E.¹

4
- 49949097554
- 4 Addison-Wesley San Francisco
- Hacht E (2002b) Optics, chap 4, 4th edn. Addison-Wesley, San Francisco
- (2002) Optics, Chap 4
- Hacht, E.¹

5
- 2342632586
- A tapered hollow metallic microneedle array using backside exposure of SU-8
- Kim K, Park DS, Lu HM, Che W, Kim K, Lee JB, Ahn CH (2004) A tapered hollow metallic microneedle array using backside exposure of SU-8. J Micromech Microeng 14:597-603
- (2004) J Micromech Microeng , vol.14 , pp. 597-603
- Kim, K.¹ Park, D.S.² Lu, H.M.³ Che, W.⁴ Kim, K.⁵ Lee, J.B.⁶ Ahn, C.H.⁷

6
- 0037677948
- Building thick photoresist structures from the bottom up
- Peterman MC, Huie P, Bloom DM, Fishman HA (2003) Building thick photoresist structures from the bottom up. J Micromech Microeng 13:380-382
- (2003) J Micromech Microeng , vol.13 , pp. 380-382
- Peterman, M.C.¹ Huie, P.² Bloom, D.M.³ Fishman, H.A.⁴

7
- 33845774866
- Fabrication of a polymeric tapered HARMs array utilizing a low-cost nickel electroplated mold insert
- Song IH, Jin Y, Ajmera PK (2007) Fabrication of a polymeric tapered HARMs array utilizing a low-cost nickel electroplated mold insert. Microsyst Technol 13:297-291
- (2007) Microsyst Technol , vol.13 , pp. 297-291
- Song, I.H.¹ Jin, Y.² Ajmera, P.K.³

8
- 10644278139
- Effect of exposure dose on the replication fidelity and profile of very high aspect ratio microchannels in SU-8
- Zhang J, Chan-Park MB, Conner SR (2004) Effect of exposure dose on the replication fidelity and profile of very high aspect ratio microchannels in SU-8. Lab Chip 4:646-653
- (2004) Lab Chip , vol.4 , pp. 646-653
- Zhang, J.¹ Chan-Park, M.B.² Conner, S.R.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.