Effect of annealing on the spectral and nonlinear optical characteristics of thin films of nano-ZnO

Journal of Applied Physics

Volumn 104, Issue 3, 2008, Pages

  Irimpan, Litty ^a   Ambika, D ^b   Kumar, V ^b   Nampoori, V P N ^a   Radhakrishnan, P ^a  

^a Department of Physics   (India)

^b CENTRE FOR MATERIALS FOR ELECTRONICS TECHNOLOGY C MET   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ANNEALING; COLLOIDS; ELECTRIC CONDUCTIVITY; ELECTRON MOBILITY; GELATION; LIGHT EMISSION; LIGHT SOURCES; LUMINESCENCE; METALLIC FILMS; NONMETALS; OPTICAL MATERIALS; OPTICAL PROPERTIES; OXIDE MINERALS; OXYGEN; OXYGEN VACANCIES; PULSED LASER APPLICATIONS; QUARTZ; SEMICONDUCTING CADMIUM TELLURIDE; SEMICONDUCTING ZINC COMPOUNDS; SOL-GEL PROCESS; SOLIDS; THICK FILMS; THIN FILMS; ZINC ALLOYS; ZINC OXIDE;

ANNEALING EFFECTS; ANNEALING PROCESSING; ANNEALING TEMPERATURE; BAND GAPS; CONDUCTION BAND EDGE; DEEP DONOR; EMISSION BANDS; GREEN LUMINESCENCE; INTERFACIAL STATES; NANOSECOND LASER PULSES; NLO RESPONSES; NONLINEAR ABSORPTION COEFFICIENTS; NONLINEAR OPTICAL; OFF-RESONANCE; OPTICAL LIMITING; OSCILLATOR STRENGTH; QUARTZ SUBSTRATES; SOL - GEL; THIRD-ORDER OPTICAL SUSCEPTIBILITY; ULTRAVIOLET EMISSION; UV LUMINESCENCE; VALENCE BANDS; ZNO THIN FILMS;

OPTICAL FILMS;

EID: 49749133232     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2949400     Document Type: Article

References (36)

1. Y. Kayanuma, Phys. Rev. B 0163-1829 10.1103/PhysRevB.38.9797 38, 9797 (1988).
2. L. Irimpan, V. P. N. Nampoori, and P. Radhakrishnan, J. Appl. Phys. 103, 094914 (2008).
3. L. Irimpan, A. Deepthy, B. Krishnan, V. P. N. Nampoori, and P. Radhakrishnan, J. Appl. Phys. 0021-8979 10.1063/1.2778637 102, 063524 (2007).
4. L. V. Azaroff, Introduction to Solids (McGraw-Hill, New York, 1960), pp. 371-372.
5. K. Vanheusden, W. L. Warren, C. H. Seager, D. R. Tallant, J. A. Voigt, and B. E. Gnade, J. Appl. Phys. 0021-8979 10.1063/1.362349 79, 7983 (1996).
6. W. Li, D. Mao, F. Zhang, X. Wang, X. Liu, S. Zou, Y. Zhu, Q. Li, and J. Xu, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/S0168-583X(00)00017-3 169, 59 (2000).
7. J. H. Lin, Y. J. Chen, H. Y. Lin, and W. F. Hsieh, J. Appl. Phys. 0021-8979 10.1063/1.1848192 97, 033526 (2005).
8. L. Irimpan, A. Deepthy, B. Krishnan, V. P. N. Nampoori, and P. Radhakrishnan, Appl. Phys. B: Lasers Opt. 0946-2171 10.1007/s00340-007-2886-1 90, 547 (2008).
9. M. Sheik-Bahae, A. A. Said, T. H. Wei, D. J. Hagan, and E. W. Van Stryland, IEEE J. Quantum Electron. 0018-9197 10.1109/3.53394 26, 760 (1990).
10. R. Viswanatha, S. Sapra, B. Satpati, P. V. Satyam, B. N. Dev, and D. D. Sharma, J. Mater. Chem. 0959-9428 10.1039/b310404d 14, 661 (2004).
11. P. Roussignol, D. Ricard, and C. Flytzanis, Appl. Phys. B: Lasers Opt. 51, 437 (1990). 0946-2171
12. E. Hanamura, Phys. Rev. B 0163-1829 10.1103/PhysRevB.37.1273 37, 1273 (1988).
13. H. Ishihara and K. Cho, Phys. Rev. B 0163-1829 10.1103/PhysRevB.42.1724 42, 1724 (1990).
14. T. Itoh, M. Furumiya, and C. Gourdon, Solid State Commun. 0038-1098 10.1016/0038-1098(90)90734-S 73, 271 (1990).
15. H. L. Cao, X. F. Qian, Q. Gong, W. M. Du, X. D. Ma, and Z. K. Zhu, Nanotechnology 0957-4484 10.1088/0957-4484/17/15/002 17, 3632 (2006).
16. S. Sapra and D. D. Sarma, Phys. Rev. B 0163-1829 10.1103/PhysRevB.69. 125304 69, 125304 (2004).
17. Y. B. Han, J. B. Han, S. Ding, D. J. Chen, and Q. Q. Wang, Opt. Express 1094-4087 10.1364/OPEX.13.009211 13, 9211 (2005).
18. J. C. Manifacier, J. Gasiot, and J. P. Fillard, J. Phys. E 0022-3735 10.1088/0022-3735/9/11/032 9, 1002 (1976).
19. P. Schroer, P. Kruger, and J. Pollmann, Phys. Rev. B 0163-1829 10.1103/PhysRevB.47.6971 47, 6971 (1993).
20. D. Li, Y. H. Leung, A. B. Djurisic, Z. T. Liu, M. H. Xie, S. L. Shi, S. J. Xu, and W. K. Chan, Appl. Phys. Lett. 0003-6951 10.1063/1.1786375 85, 1601 (2004).
21. P. S. Xu, Y. M. Sun, C. S. Shi, F. Q. Xu, and H. B. Pan, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/S0168-583X(02)01425-8 199, 286 (2003).
22. J. Z. Wang, G. T. Du, Y. T. Zhang, B. J. Zhao, X. T. Yang, and D. L. Liu, J. Cryst. Growth 0022-0248 10.1016/j.jcrysgro.2003.11.059 263, 269 (2004).
23. T. K. Gupta and W. D. Straub, J. Appl. Phys. 0021-8979 10.1063/1.346766 68, 845 (1990).
24. V. Gavryushin, G. Raciukaitis, D. Judozbalis, A. Kazlauskas, and V. Kubertavicius, J. Cryst. Growth 0022-0248 10.1016/0022-0248(94)90933-4 138, 924 (1994).
25. M. S. Bahae, A. A. Said, and E. W. van Stryland, Opt. Lett. 0146-9592 10.1038/342955a0 14, 955 (1989).
26. X. J. Zhang, W. Ji, and S. H. Tang, J. Opt. Soc. Am. B 0740-3224 10.1364/JOSAB.14.001951 14, 1951 (1997).
27. R. G. Xie, J. Q. Zhuang, L. L. Wang, W. S. Yang, D. J. Wang, T. J. Li, and J. N. Yao, Gaodeng Xuexiao Huaxue Xuebao 24, 2086 (2003).
28. Y. Li, M. Takata, and A. Nakamura, Phys. Rev. B 57, 9193 (1998).
29. L. Irimpan B. Krishnan, A. Deepthy, V. P. N. Nampoori, and P. Radhakrishnan, J. Appl. Phys. 0021-8979 10.1063/1.2838178 103, 033105 (2008).
30. G. Wang, G. T. Kiehne, G. K. L. Wong, J. B. Ketterson, X. Liu, and R. P. H. Chang, Appl. Phys. Lett. 0003-6951 10.1063/1.1435065 80, 401 (2002).
31. H. Cao, J. Y. Xu, E. W. Seelig, and R. P. H. Chang, Appl. Phys. Lett. 0003-6951 10.1063/1.126557 76, 2997 (2000).
32. L. Guo, S. Yang, C. Yang, P. Yu, J. Wang, W. Ge, and G. K. L. Wong, Appl. Phys. Lett. 0003-6951 10.1063/1.126511 76, 2901 (2000).
33. A. Nakamura, H. Yamada, and T. Tokizaki, Phys. Rev. B 0163-1829 10.1103/PhysRevB.40.8585 40, 8585 (1989).
34. C. S. Suchand Sandeep, R. Philip, R. Satheeshkumar, and V. Kumar, Appl. Phys. Lett. 0003-6951 10.1063/1.2335375 89, 063102 (2006).
35. Y. Sun, J. E. Riggs, K. B. Henbest, and R. B. Martin, J. Nonlinear Opt. Phys. Mater. 0218-8635 10.1142/S0218863500000315 9, 481 (2000).
36. F. M. Qureshi, S. J. Martin, X. Long, D. D. C. Bradley, F. Z. Heneri, W. J. Balu, E. C. Smith, C. H. Wang, A. K. Kar, and H. L. Anderson, Chem. Phys. 0301-0104 10.1016/S0301-0104(98)00081-0 231, 87 (1998).