A new approach on the Cu UPD on Ag surfaces

Journal of Electroanalytical Chemistry

Volumn 621, Issue 1, 2008, Pages 7-12

  Thiel, K O ^a   Hintze, M ^a   Vollmer, A ^b   Donner, C ^a  

^a FREIE UNIVERSITÄT BERLIN   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

Au(1 1 1); Chronocoulometry; Cu UPD; Cyclic voltammetry; Silver; Thymine; XPS

Indexed keywords

BIOELECTRIC PHENOMENA; COPPER; COPPER ALLOYS; CYCLIC VOLTAMMETRY; ELECTRON ENERGY LEVELS; IONS; METAL IONS; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; NEGATIVE IONS; PHOTOELECTRON SPECTROSCOPY; SUBSTRATES; VOLTAMMETRY;

AU(1 1 1); CHRONOCOULOMETRY; COPPER IONS; CU UPD; NEW APPROACHES; POTENTIAL STEPS; SILVER; SILVER SUBSTRATES; THYMINE; X-RAY PHOTOELECTRON SPECTROSCOPY XPS; XPS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 49749099251     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2008.03.001     Document Type: Article

References (25)

1. Herrero E., Buller L.J., and Abruna H.D. Chemical Reviews 101 (2001) 1897
2. Budevski E., Staikov G., and Lorenz W.J. Electrochemical Phase Formation and Growth (1996), VCH Verlagsgesellschaft mbH, Weinheim
3. Staikov G., Jüttner K., Lorenz W.J., and Budevski E. Electrochimica Acta 39 (1994) 1019
4. Ogaki K., and Itaya K. Electrochimica Acta 40 (1995) 1249
5. Kolb D.M., and Gerischer H. Surface Science 51 (1975) 323
6. Gerischer H., Kolb D.M., and Przasnyski M. Surface Science 43 (1974) 662
7. Kolb D.M., Przasnyski M., and Gerischer H. Journal of Electroanalytical Chemistry 54 (1974) 25
8. Sánchez C.G., Del Pópolo M.G., and Leiva E.P.M. Surface Science 421 (1999) 59
9. Xu J.G., and Wang X.W. Surface Science 408 (1998) 317
10. Shi Z., Wu S., and Lipkowski J. Electrochimica Acta 40 (1995) 9
11. Omar I.H., Pauling H.J., and Jüttner K. Journal of the Electrochemical Society 140 (1993) 2187
12. Schneeweiss M.A., and Kolb D.M. Physica Status Solidi A: Applied Research 173 (1999) 51
13. Avci E., Meyer C., and Donner C. Journal of Electroanalytical Chemistry 589 (2006) 24
14. Dietterle M., Will T., and Kolb D.M. Surface Science 342 (1995) 29
15. Citrin P.H., and Wertheim G.K. Physical Review Letters 41 (1978) 1425
16. Heimann P., van der Veen J.F., and Eastman D.E. Solid State Communications 38 (1981) 595
17. Eastman D.E., Himpsel F.J., and van der Veen J.F. Journal of Vacuum Science & Technology 20 (1982) 609
18. Valette G., and Hamelin A. Journal of Electroanalytical Chemistry 45 (1973) 301
19. Soliman K.A., and Kibler L.A. Electrochimica Acta 52 (2007) 5654
20. Mee C.H.B., and Dweydari A.W. Physica Status Solidi A: Applied Research 17 (1973) 247
21. E. Avci, C. Meyer, A. Vollmer, C. Donner, in: 57th Annual Meeting of the ISE, Edinburgh, 2006.
22. Vollmer A., Avci E., Thiel K.-O., and Donner C. Journal of Electroanalytical Chemistry 605 (2007) 15
23. Rooryck V., Reniers F., Buess-Herman C., Attard G.A., and Yang X. Journal of Electroanalytical Chemistry 482 (2000) 93
24. Donner C. Journal of Electroanalytical Chemistry 550-551 (2003) 209
25. Thiel K.-O., Vollmer A., Hintze M., Avci E., and Donner C. Zeitschrift fuer Physikalische Chemie (Munich) 221 (2007) 1255