Two-beam-current method for e-beam writing gray-scale masks and its application to high-resolution microstructures

Applied Optics

Volumn 47, Issue 17, 2008, Pages 3177-3184

  Zhou, Zhou ^a,b   Lee, Sing H ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Triage Wireless Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; LITHOGRAPHY;

DEEP ULTRAVIOLET LITHOGRAPHY; DYNAMIC RANGE; GRAY SCALE MASK; HIGH RESOLUTION; INDUCTIVELY COUPLED-PLASMA REACTIVE ION ETCHING; ITS APPLICATIONS; MICRO-OPTICAL ELEMENTS; TWO BEAMS;

REACTIVE ION ETCHING;

EID: 49649120902     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.003177     Document Type: Article

References (4)

1. Z. Zhou and S. H. Lee, "Fabrication of an improved gray-scale mask for refractive micro- and meso-optics," Opt. Lett. 29, 457-458 (2004).
2. Leica VB Parameter Calculator, http://www.research.ibm.com/people/r/ rooks/calc.html
3. C. Wu, "Method of making high energy beam sensitive glasses," U.S. patent 5,078,771 (7 January 1992).
4. S. H. Lee, M. S. Jin, and M. L. Scott, "Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics," U.S. patent 6,534,221 (18 March 2003).