Preparation of fluorine-containing indium tin oxide sputtering targets using spark plasma sintering process

Journal of the American Ceramic Society

Volumn 91, Issue 8, 2008, Pages 2495-2500

  Takeuchi, Tomonari ^a   Kageyama, Hiroyuki ^a   Nakazawa, Hiromi ^b,d   Atsumi, Toshiyuki ^b   Tamura, Shigeharu ^b   Kamijo, Nagao ^c   Takeuchi, Akihisa ^c   Suzuki, Yoshio ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Geomatec Co Ltd   (Japan)

^c JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^d MITSUBISHI MATERIALS CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DISKS (MACHINE COMPONENTS); DISKS (STRUCTURAL COMPONENTS); ELECTRIC CONDUCTIVITY; ELECTRIC SPARKS; FLUORINE; INDIUM; OPTICAL CONDUCTIVITY; PLASMAS; SINTERING; SPARK PLASMA SINTERING; SURFACE ROUGHNESS; TARGETS; THICK FILMS; TIN; TITANIUM COMPOUNDS;

DEPOSITED FILMS; ELECTRICAL CONDUCTIVITY; FLUORINE CONTENTS; GLASS SUBSTRATES; INDIUM TIN OXIDE; ITO FILMS; OPTICAL TRANSMISSIONS; SPARK-PLASMA-SINTERING-PROCESS; SPS PROCESS; SPUTTERING TARGETS; THIN FILMS;

FILM PREPARATION;

EID: 49549110221     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2008.02503.x     Document Type: Article

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