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Journal of Materials Science Letters

Volumn 21, Issue 11, 2002, Pages 855-857

Rapid preparation of indium tin oxide sputtering targets by spark plasma sintering

(6) Takeuchi, T a Ishida, T a Ichikawa, K a Miyamoto, S b Kawahara, M b Kageyama, H a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b Izumi Technology Co Ltd (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; CERAMIC MATERIALS; DENSITY (SPECIFIC GRAVITY); INDIUM COMPOUNDS; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; POWDERS; QUARTZ; SINTERING; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

INDIUM TIN OXIDE; PELLETS; SPARK PLASMA SINTERING; SPUTTERING TARGETS;

OXIDES;

EID: 0036612511 PISSN: 02618028 EISSN: None Source Type: Journal
DOI: 10.1023/A:1015718511242 Document Type: Article

Times cited : (10)

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