MOCVD growth and characterization of cobalt phosphide thin films on InP substrates

Journal of the Electrochemical Society

Volumn 151, Issue 9, 2004, Pages

  Barreca, Davide ^a   Camporese, Andrea ^b   Casarin, Maurizio ^a   El Habra, Naida ^b   Gasparotto, Andrea ^a   Natali, Marco ^b   Rossetto, Gilberto ^b   Tondello, Eugenio ^a   Zanella, Pierino ^b  

^a UNIVERSITY OF PADOVA   (Italy)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EVAPORATION; FERROMAGNETIC MATERIALS; GIANT MAGNETORESISTANCE; MOLECULAR BEAM EPITAXY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TRANSITION METALS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL-PHYSICAL CHARACTERISTICS; DILUTED MAGNETIC SEMICONDUCTORS (DMS); MAGNETIC RANDOM ACCESS MEMORIES (MRAM);

THIN FILMS;

EID: 4944256712     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1782633     Document Type: Article

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