A connection between empirical bond strength and the localization of the electron density at the bond critical points of the SiO bonds in silicates

Journal of Physical Chemistry A

Volumn 108, Issue 38, 2004, Pages 7643-7645

  Gibbs, G V ^a   Cox, D F ^b   Rosso, K M ^c  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

^b Virginia Polytechnic Institute and State University   (United States)

^c PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOND CRITICAL POINTS; POLYMORPHS; REGRESSION LINES; RESONANCE BOND NUMBERS;

APPROXIMATION THEORY; BOND STRENGTH (CHEMICAL); CARRIER CONCENTRATION; CHEMICAL BONDS; CORRELATION METHODS; ELECTRONIC STRUCTURE; MATHEMATICAL MODELS; REGRESSION ANALYSIS; SILICA;

SILICATES;

EID: 4944232303     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp047202s     Document Type: Article

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