Reduction of silver complexes: Towards an ever more elaborated insight in the influence of the type of ligand on the reaction rate

Journal of Electroanalytical Chemistry

Volumn 572, Issue 2, 2004, Pages 399-408

  Hubin, A ^a   Simons, W ^a   Pauwels, L ^a   Vereecken, J ^a  

^a VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

Author keywords

Charge transfer kinetics; Density distributions of electronic energy levels in solution; Energy band models; Silver complexes; Ti TiO2 semiconductor

Indexed keywords

CHARGE TRANSFER; DENSITY (SPECIFIC GRAVITY); ELECTRIC POTENTIAL; MATHEMATICAL MODELS; PROBABILITY; REACTION KINETICS; SPECTROSCOPIC ANALYSIS;

CHARGE TRANSFER KINETICS; DENSITY DISTRIBUTION OF ELECTRONIC ENERGY LEVELS IN SOLUTION; ENERGY BAND MODELS (EBM); SILVER COMPLEXES; TI/TIO2 SEMICONDUCTORS;

SILVER COMPOUNDS;

EID: 4944222397     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2004.04.018     Document Type: Article

References (44)

1. James T.H. James T.H. The Theory of the Photographic Process. fourth ed. 1977;Macmillan, New York. (Chapter 13).
2. Sahyun M.R.V. J. Imag. Sci. Tech. 42(1):1998;23.
3. Pauwels L., Simons W., Hubin A., Schoukens J., Pintelon R. Electrochim. Acta. 47:2002;2135.
4. Simons W., Pauwels L., Hubin A. Electrochim. Acta. 47:2002;2169.
5. Vandeputte S., Hubin A., Vereecken J., Deslouis C., Tribollet B. J. Electrochem. Soc. 147 (8):2000;3054.
6. Gonnissen D., Hubin A., Vereecken J. Electrochim. Acta. 44:1999;4129.
7. D. Gonnissen, W. Simons, A. Hubin, in: M. Matlosz, D. Landolt, R. Aogaki, Y. Sato, J.B. Talbot (Eds.), Fundamental Aspects of Electrochemical Deposition and Dissolution, Proceedings of The Electrochemical Society, 99-33 (2000) 71.
8. W. Siimons, D. Gonnissen, A. Hubin in: M. Datta (Ed.), Fundamental Aspects of Electrochemical Deposition and Dissolution, Proceedings of The Electrochemical Society, 99-27 (1998) 124.
9. Gonnissen D., Langenaeker W., Hubin A., Geerlings P. J. Raman Spectrosc. 29:1998;1031.
10. Simons W., Gonnissen D., Hubin A. J. Electroanal. Chem. 433:1997;141.
11. Gonnissen D., Simons W., Hubin A. J. Electroanal. Chem. 433:1997;149.
12. Vandeputte S., Hubin A., Vereecken J. Electrochim. Acta. 42:1997;3429.
13. Gonnissen D., Vandeputte S., Hubin H., Vereecken J. Electrochim. Acta. 41:1996;1051.
14. Vandeputte S., Verboom E., Hubin A., Vereecken J. J. Electroanal. Chem. 397:1995;249.
15. Vandeputte S., Tribollet B., Hubin A., Vereecken J. Electrochim. Acta. 33:1994;2729.
16. Hubin A., Vereecken J. J. Appl. Electrochem. 24:1994;396.
17. Hubin A., Vereecken J. J. Appl. Electrochem. 24:1994;239.
18. Morrison S.R. Electrochemistry at Semiconductor and Oxidized Metal Electrodes. 1980;Plenum Press, New York.
19. Gerischer H. Electrochim. Acta. 35(11-12):1990;1677.
20. Memming R. Mattay J. Topics in Current Chemistry, Electron Transfer. 1994;Springer Verlag, Berlin.
21. Marcus R.A. J. Chem. Phys. 24:1956;966.
22. Marcus R.A. Can. J. Chem. 37:1959;155.
23. Marcus R.A. J. Chem. Phys. 43:1965;679.
24. Dogonadze R.R., Kuznetsov A.M., Chernenko A.A. Russ. Chem. Rev. 34:1965;759.
25. Christov S.G. Ber. Bunsenges. Phys. Chem. 79:1975;357.
26. Gerischer H. Z. Phys. Chem. (Frankfurt). 26:1960;223. 325.
27. Gerischer H. Z. Phys. Chem. (Frankfurt). 27:1961;40.
28. Pleskov Y.V. Bockris J. O'M., Conway B.E., Yeager E. Comprehensive Treatise of Electrochemistry. The Double Layer. vol. 1:1980;Plenum Press, New York. (Chapter 6).
29. Memming R. Conway B.E., Bockris J. O'M., Yeager E., Khan S.U.M., White R.E. Comprehensive Treatise of Electrochemistry. Kinetics and Mechanisms of Electrode Processes. vol. 7:1983;Plenum Press, New York. (Chapter 8).
30. Finklea H.O. Finklea H.O. Semiconductor Electrodes. 1987;Elsevier, New York. (Chapter 1).
31. Khan S.U.M., Bockris J. O'M. Khan S.U.M., Bockris J. O'M. Surface Electrochemistry - A Molecular Level Approach. 1993;Plenum Press, New York. (Chapter 2).
32. Frese K.W. J. Phys. Chem. 85:1981;3911.
33. Marcus R.A. J. Phys. Chem. 94:1990;1050.
34. Marcus R.A. J. Phys. Chem. 98:1994;7162.
35. Morisaki H., Ono H., Yazawa K. J. Electrochem. Soc. 135(2):1988;381.
36. Vanden Berghe R.A.L., Cardon F., Gomes W.P. Surf. Sci. 39:1973;368.
37. Miller R.J.D. Miller R.J.D., McLendon G.L., Nozik A.J., Schmickler W., Willig F. Surface Electron Transfer Processes. 1995;VCH Publishers, Inc. New York. (Chapter 4).
38. W. Simons, PhD Thesis, Vrije Universiteit Brussel (VUB), Brussels, 2001.
39. Rhoderick E.H., Williams R.H. Metal-Semiconductor Contacts. 1988;Oxford Science Publishers, Oxford.
40. Dweydari A.W., Mee C.H.B. Phys. Status Solid. 27:1975;223.
41. Berube Y.G., De Bruyn P.L. J. Colloid Interface Sci. 27:1968;305.
42. Kudelka S., Michaelis A., Schultze J.W. Ber. Bunsenges. Phys. Chem. 99:1995;1020.
43. Delplancke J.-L., Ongaro M., Winand R. J. Appl. Electrochem. 22:1992;843.
44. Delplancke J.-L., Garnier A., Massiani Y., Winand R. Electrochim. Acta. 39:1994;1281.