Seal formation in silicon planar patch-clamp microstructures

Journal of Microelectromechanical Systems

Volumn 17, Issue 4, 2008, Pages 974-983

  Curtis, John C ^a   Baldwin, Keith ^a   Dworak, Baldwin J ^a   Stevenson, Tom J M ^a   Delivopoulos, Evangelos ^a   MacLeod, Nikki K ^a   Murray, Alan F ^a  

^a UNIVERSITY OF EDINBURGH   (United Kingdom)

Author keywords

Atomic force microscopy; Biomedical transducers; Electrophysiology; Microelectrodes; Microelectromechanical devices; Micromachining; N2a cells; Silicon

Indexed keywords

NONMETALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON COMPOUNDS;

ATOMIC FORCE MICROSCOPY; BIOMEDICAL TRANSDUCERS; CHEMICAL VAPORS; ELECTRODE DESIGN; ELECTROPHYSIOLOGY; MICROELECTRODES; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; N2A CELLS; PHYSICAL CHARACTERISTICS; PLANAR PATCH;

SEALING (FINISHING);

EID: 49149106249     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2008.924270     Document Type: Article

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