Unsaturated fluorocarbons in the etching process, environmental benefit, technical hurdles

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn , Issue , 2008, Pages 37-42

  Tran Quinn, Thuy ^a   Lakritz, Mark ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ENVIRONMENTAL CONCERNS; ETCHING PROCESSES; SATURATED HYDROCARBONS; SEMICONDUCTOR MANUFACTURING; UNSATURATED FLUOROCARBONS; UNSATURATED HYDROCARBONS;

ELECTRIC CONDUCTIVITY; ETCHING; HYDROCARBONS; POLYCYCLIC AROMATIC HYDROCARBONS; SEMICONDUCTOR MATERIALS;

ORGANIC COMPOUNDS;

EID: 49149084488     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2008.4529003     Document Type: Conference Paper

References (5)

1. The Use of Unsaturated Fluorocarbon for Dielectric Etch Applications. Ritwik Chatterjee, Simon Karecki, Rafael Reif, Victor Vartanian and Terry Sparks., Journal of the Electrochemical Society, G276-G285.
2. The Evaluation of Hexaflouro-1,3-butadiene as an environmentally benign dielectric etch chemistry in a medium-density etch chamber .R. Chatterjee, R Reif , T. Sparks, Vatanian, B Goolsby and L. Mendicino, Electrochemical Society Proceeding, Volume 2002-15.
3. 8/Ar discharges. Xi Li, Xuefeng Hua, Li Ling and Gottlieb S. Oehrlein,Marcos Barela and Harold M. Anderson'J., Vac. Sci. Technology, Nov/Dec 2002.
4. 2/Ar Plasma, Hyun-Kyu Ryu, Byung-Seok Lee, Sung-Ki Park, Il-Wook Kim and Chang Koo Kim. Electrochemical and Solid State Letter.
5. The Evaluation of exafluorobenzene as an Environmentally Benign Dielectric Etch Chemistry.. Ritwik Chatterjee, Simon Karecki, and Brian Goolsby . 148 Journal of the Electrochemical Society, G721-G724.