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A requirement for a photochemical reaction on solid support is the lack of absorption by the polymer in the region that is needed to excite the substrate. Polystyrene resins absorb weakly above 300 nm, and they can be used to anchor systems that require long-wavelength UV or visible light for activation
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A requirement for a photochemical reaction on solid support is the lack of absorption by the polymer in the region that is needed to excite the substrate. Polystyrene resins absorb weakly above 300 nm, and they can be used to anchor systems that require long-wavelength UV or visible light for activation.
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Typical procedure: A solution of p-carboxybenzaldehyde (99.1 mg, 0.66 mmol, 3 equiv, DIC (0.10 mL, 0.66 mmol, 3 equiv, and DMAP (cat, in anhydrous DCM (7 mL) was added to Wang resin (200 mg, 1.1 mmol/g) under nitrogen atmosphere. The mixture was stirred for 18 h at room temperature. After filtration, the resulting resin lb was washed with MeOH (3 x 3 mL, DMF (3 x 3 mL, and DCM (3 x 3 mL) and dried under high vacuum. A solution of β-ionone 2a (0.90 mL, 4.4 mmol, 20 equiv) in anhydrous DME (2 mL) was added to resin 1b (0.22 mmol) under nitrogen atmosphere. Then, LiOH (105.4 mg, 4.4 mmol, 20 equiv, was added with stirring. The mixture was stirred for 18 h under nitrogen atmosphere at room temperature, after which the resin was filtered, washed with AcOH (3 x 3 mL, H2O (2 x 3 mL, MeOH (2 x 3 mL, DMF (3 x 3 mL, MeOH (3 x 3 mL, and DCM 3 x 3 mL, and finally dried in high vacuum. The resin was then resubjected to the same reaction conditions t
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1,6]dodec-11-en- 8-yl)vinyl]-benzoic acid ethyl ester (6c) (31% overall yield, based on the initial loading level of the Wang resin).
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