Landscape of combinatorial materials exploration and high throughput characterizations for the post-cmos devices

International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Volumn , Issue , 2008, Pages 66-67

  Chikyow, T ^a   Ohmori, K ^b   Nagata, T ^b   Umezawa, N ^a   Haemori, M ^a   Yoshitake, M ^a   Hasegawa, T ^d   Koinuma, H ^a,c,d   Yamada, K ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b WASEDA UNIVERSITY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 49049086914     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VTSA.2008.4530801     Document Type: Conference Paper

References (6)

1. For example, International Technology Road Map in Semiconductors 2006 ( Semiconductor Industry Association, San Jose, CA, 1999) p105
2. K. Ohmori et al. J. Appl. Phys. 101 (2007) 084118
3. X.D.Xiang, Science 268 1738 (1995)
4. or J.Wang et al Science 2791712-1714 (1998)
5. K.Hasegawa, P.Ahmet, N. Okazaki, T.Hasegawa, K.Fujimoto, M.Watanabe, T.Chikyow, and H.Koinuma; Appl.Surf.Sci. 223 229-232 (2004)
6. K.Ohmori et al IEDM 2007 345-348 (2007)